The high-temperature resistant quartz cleaning rack is a high-purity cleaning and carrying tool designed specifically for the semiconductor, photovoltaic, and optoelectronic industries. It is precision processed from high-quality natural quartz or synthetic quartz materials, with excellent high temperature resistance and excellent chemical stability. In various acid pickling, high-temperature annealing, and wet etching processes, this product can effectively avoid metal ion pollution, ensure the cleanliness and yield of precision components such as wafers and silicon wafers in extreme environments, and is an indispensable process consumable in modern precision manufacturing.

FAQ

Q1: What is the maximum temperature that this quartz cleaning rack can withstand?

A: Our quartz cleaning rack is made of high-purity quartz material with a softening point of up to 1730 ℃. It can work stably in high temperature environments of 1100 ℃ -1200 ℃ for a long time and has excellent thermal shock resistance. It can withstand severe temperature changes without bursting.

Q2: Will the quartz frame be corroded when used in a strong acid or strong alkali cleaning tank?

A: Quartz has extremely strong acid and alkali corrosion resistance (except hydrofluoric acid). In conventional semiconductor wet cleaning processes (such as sulfuric acid, hydrogen peroxide, ammonia water, etc. used in RCA cleaning), quartz cleaning racks can maintain extremely high chemical inertness and will not precipitate impurities to contaminate the cleaning solution.

Q3: Do you support non-standard customization? How long is the usual customization cycle?

A: Yes, we provide comprehensive customized services. We can process special card slot designs, irregular structures, or specific dimensional tolerances according to your drawings or samples. The regular customization cycle is usually 7-15 working days, depending on the complexity of the process.

Q4: What are the advantages of quartz cleaning racks over PTFE or stainless steel cleaning racks?

A: Compared to stainless steel, quartz has extremely high purity (SiO2 content ≥ 99.99%) and no risk of metal ion precipitation; Compared to PTFE, quartz has stronger temperature resistance and is suitable for cleaning and carrying in high-temperature diffusion furnaces. It also has higher mechanical strength and is not easily deformed.

User needs and problem solving

For those of you who pursue the ultimate yield, our product addresses the following core challenges:

Eliminate secondary pollution: solve the problem of impurities precipitation on the surface of wafers caused by traditional metal or inferior material fixtures in high-temperature acidic environments.

Extend service life: Solve the problem of common fixtures being prone to deformation and cracking during frequent thermal expansion and contraction, resulting in high replacement frequency and uncontrollable costs.

Improving process stability: By precision dimensional processing, the consistency of the load-bearing position of each batch of products is ensured, solving the problem of automatic production line transmission lag or uneven heating.

Application and core advantages

Our high-temperature resistant quartz cleaning rack is widely used in semiconductor wafer manufacturing, solar cell production, LED sapphire substrate processing, and precision optical glass processing.

Core advantages:

Ultra high purity material: High purity quartz sand is selected, with extremely low metal impurity content (trace elements such as Fe, Al, K, Na are controlled at PPM level), ensuring process cleanliness from the source.

Excellent processing accuracy: Advanced CNC engraving and laser processing technology are adopted, and the slot tolerance can be controlled within ± 0.05mm, ensuring smooth insertion and removal of silicon wafers/wafers without the risk of scratches.

Excellent thermal shock resistance: After strict annealing process to eliminate internal stress, it maintains structural integrity even when quickly placed in a high-temperature furnace (or vice versa) from room temperature.

Diversified specification customization:

Slot customization: We can provide various designs such as V-shaped slots, U-shaped slots, and stepped slots, which are suitable for different specifications of wafers and square silicon wafers such as 4-inch, 6-inch, 8-inch, and 12 inch.

Structural customization: Supports various structural designs such as single piece, multi piece stacking, basket style, etc., to meet the loading needs of different cleaning machines and diffusion furnaces.

Accessory combination: can be paired with quartz cover, quartz handle and other components to form a complete cleaning and carrying system.

Customer Application Cases

Case 1: A well-known photovoltaic cell production enterprise

Problem faced: During the cleaning and velvet making process of PERC cells, the customer's original PTFE flower basket experienced slight swelling and deformation due to long-term immersion in high-temperature alkaline solution, resulting in frequent chip dropping accidents when the robotic arm grabbed it. Additionally, there were occasional impurities precipitated at the bottom of the cleaning tank, which affected the conversion efficiency of the cells.

Solution: We have customized a thickened high-temperature resistant quartz cleaning flower basket for it. For its automated production line, we have specially optimized the bottom support foot design to enhance overall rigidity; At the same time, special polishing treatment was carried out on the surface to reduce the phenomenon of liquid hanging.

Application effectiveness: After 6 months of replacement use, customers reported a 98% decrease in the chip dropping rate on the production line. Additionally, due to the high transparency and chemical stability of quartz, the precipitation of impurities in the cleaning tank was significantly reduced, and the average photoelectric conversion efficiency of the battery cells increased by 0.05%.

Case 2: A third-generation semiconductor silicon carbide (SiC) substrate processing factory (anonymous)

Facing problems: Silicon carbide substrates have high hardness and high value, and the cleaning process involves high temperature and strong acid. Due to the unreasonable design of the card slot, the customer's previous quartz frame was prone to micro cracks at the edge of the card slot under thermal shock, which could scratch the substrate surface and cause huge economic losses.

Solution: The technical team has had in-depth communication with the customer engineer, redesigned the R-angle curvature of the card slot, and used synthetic quartz material to improve material uniformity. We introduced multiple annealing processes during the processing to ensure thorough stress relief.

Application effect: The newly customized quartz cleaning rack has successfully withstood the test of 1200 ℃ high-temperature annealing process, and has been continuously used for more than 500 cycles without cracks or deformations, perfectly protecting high-value SiC substrates and gaining high recognition from the customer's R&D department.

If you are looking for a quartz cleaning and bearing solution with high stability and long lifespan, please feel free to contact us at any time! Please provide your specific dimensions, operating temperature, and process environment requirements, and our engineers will provide you with free selection suggestions and accurate quotations.

Luverre Quartz manufactures and sells a wide range of high quality fused quartz glass, including fused quartz tubes, fused quartz plates, fused quartz rods, fused quartz windows, fused quartz crucibles, fused quartz boats, fused quartz flanges, fused quartz beakers, fused quartz glass instruments, and more. We can meet all kinds of customized requirements for fused quartz glass products.

For more information, please feel free to contact us.