Semiconductor manufacturing fused silica glass plate
The fused silica glass plate used in semiconductor manufacturing is a high-tech material, which is mainly used in semiconductor, electro-optic source, semiconducting communication device, laser, optical instrument and other fields.
LUVERRE quartz
99.99%
Inner with Vacuum PVC bag and then wrapped with air bubble film, outer with wooden box.
as per customer's requirement
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Semiconductor manufacturing fused silica glass plate
The fused silica glass plate used in semiconductor manufacturing is a high-tech material, which is mainly used in semiconductor, electro-optic source, semiconducting communication device, laser, optical instrument and other fields. This material is a special glass made by melting pure natural quartz (such as crystal, quartz sand, etc.) and containing only silicon dioxide as a single component. Quartz glass can be processed in various ways. According to different types, processes and raw materials, it can be divided into silicate glass, quartz glass, fused silica, synthetic fused silica, fused quartz, etc.
The microstructure of semiconductor quartz glass is composed of a tetrahedral structure of silicon dioxide, with a high Si-O chemical bond energy, resulting in a compact structure and unique properties. This type of glass has significant optical characteristics such as high transmittance, low thermal expansion, and excellent spectral properties, making it suitable for high-precision manufacturing of photomask substrates.
In the semiconductor industry, the manufacturing process and raw material requirements for high-purity opaque quartz glass are very strict. The preparation process includes steps such as melting, hot working, and cold working. The melting process mainly includes electric melting and gas refining, while the manufacturing process for synthesizing quartz glass includes chemical vapor deposition (CVD), plasma chemical vapor deposition (PCVD), etc.
Fused silica glass is widely used in semiconductor manufacturing, such as batch processing equipment and wafer processing equipment. This quartz glass has the characteristics of high purity and material uniformity, while maintaining a low bubble content, which is crucial for accuracy and reliability in semiconductor manufacturing processes.
The fused silica glass plate used in semiconductor manufacturing is a key basic material. Its high purity, excellent optical properties and chemical stability make it play an important role in semiconductor manufacturing.
Why choose us?
1.We are more experienced.
We have over 18 years production experience of quartz items.
2.We are more efficient.
We reply customers’ requests within 24 hours and we have high efficient production, engineers and sales team.
3.Our quality is more guaranteed.
We control the quality from quartz lumps to quartz sand and then quartz products, we have better and stricter quality control than other manufactures.
4.We are able to produce more difficult quartz products.
We have large grinding platforms and precision etching machines which enable us to produce large sizes of quartz plates, tubes and high size precision quartz items.
Semiconductor manufacturing fused silica glass plate
The fused silica glass plate used in semiconductor manufacturing is a high-tech material, which is mainly used in semiconductor, electro-optic source, semiconducting communication device, laser, optical instrument and other fields. This material is a special glass made by melting pure natural quartz (such as crystal, quartz sand, etc.) and containing only silicon dioxide as a single component. Quartz glass can be processed in various ways. According to different types, processes and raw materials, it can be divided into silicate glass, quartz glass, fused silica, synthetic fused silica, fused quartz, etc.
The microstructure of semiconductor quartz glass is composed of a tetrahedral structure of silicon dioxide, with a high Si-O chemical bond energy, resulting in a compact structure and unique properties. This type of glass has significant optical characteristics such as high transmittance, low thermal expansion, and excellent spectral properties, making it suitable for high-precision manufacturing of photomask substrates.
In the semiconductor industry, the manufacturing process and raw material requirements for high-purity opaque quartz glass are very strict. The preparation process includes steps such as melting, hot working, and cold working. The melting process mainly includes electric melting and gas refining, while the manufacturing process for synthesizing quartz glass includes chemical vapor deposition (CVD), plasma chemical vapor deposition (PCVD), etc.
Fused silica glass is widely used in semiconductor manufacturing, such as batch processing equipment and wafer processing equipment. This quartz glass has the characteristics of high purity and material uniformity, while maintaining a low bubble content, which is crucial for accuracy and reliability in semiconductor manufacturing processes.
The fused silica glass plate used in semiconductor manufacturing is a key basic material. Its high purity, excellent optical properties and chemical stability make it play an important role in semiconductor manufacturing.
Why choose us?
1.We are more experienced.
We have over 18 years production experience of quartz items.
2.We are more efficient.
We reply customers’ requests within 24 hours and we have high efficient production, engineers and sales team.
3.Our quality is more guaranteed.
We control the quality from quartz lumps to quartz sand and then quartz products, we have better and stricter quality control than other manufactures.
4.We are able to produce more difficult quartz products.
We have large grinding platforms and precision etching machines which enable us to produce large sizes of quartz plates, tubes and high size precision quartz items.